We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Plasma cleaner.
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Plasma cleaner Product List and Ranking from 6 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Jul 09, 2025～Aug 05, 2025
This ranking is based on the number of page views on our site.

Plasma cleaner Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Jul 09, 2025～Aug 05, 2025
This ranking is based on the number of page views on our site.

  1. サムコ Kyoto//Industrial Machinery
  2. null/null
  3. レヨーン工業 Ibaraki//Industrial Electrical Equipment
  4. 4 ハイソル Tokyo//Electronic Components and Semiconductors
  5. 5 リバティー Saitama//Trading company/Wholesale
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Plasma cleaner Product ranking

Last Updated： Aggregation Period:Jul 09, 2025～Aug 05, 2025
This ranking is based on the number of page views on our site.

  1. Plasma Cleaner PC-1100 サムコ
  2. Plasma cleaner
  3. Plasma Cleaner PC-300 サムコ
  4. Atmospheric Pressure Plasma Cleaner "RPLU-100A Series" レヨーン工業
  5. 5 Plasma Cleaner G1000 ハイソル

Plasma cleaner Product List

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Plasma Cleaner G1000

Plasma Cleaner G1000

Plasma cleaner with a parallel plate method, optimal for cleaning bonding pads (improving bondability) and surface modification/hydrophilization (molding pretreatment).

G1000 / G500 is a system that utilizes the etching effect of gas plasma to clean the surface of objects under low-pressure conditions. By selecting the appropriate gas for your application (such as argon, oxygen, hydrogen + argon, etc.), it effectively removes not only organic but also inorganic contaminants. This system is ideal for improving bonding strength through the cleaning of bonding surfaces on HIC substrates and lead frames, as well as enhancing wettability through surface modification (hydrophilization).

  • Other semiconductor manufacturing equipment

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Atmospheric Pressure Plasma Cleaner "RPLU-100A Series"

Atmospheric Pressure Plasma Cleaner "RPLU-100A Series"

Introducing a plasma cleaner that can be used under atmospheric pressure to remove fine dirt from the work surface!

The "RPLU-100A series" is an atmospheric pressure plasma cleaner that achieves high-quality surface treatment while keeping initial costs low, enabling increased productivity. No wet cleaning is required. It removes fine dirt from the work surface and forms hydrophilic functional groups on the surface. It is available in both "rotating head" and "non-rotating" models, making it very effective for applications where adhesion has been difficult due to strength issues, or when a little more peel strength is desired. 【Features】 ■ Removes fine dirt from the work surface ■ Forms hydrophilic functional groups on the surface ■ No wet cleaning required ■ Surface treatment possible in a dry environment ■ Improves hydrophilicity (wetting properties) ■ Increases adhesion and bonding capabilities *For more details, please refer to the PDF document or feel free to contact us.

  • Plasma surface treatment equipment
  • Other surface treatment equipment

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Plasma Cleaner PC-1100

Plasma Cleaner PC-1100

This is a batch-type plasma cleaner that is ideal for surface cleaning of plastic packages, LCD substrates, hybrid ICs, and more.

The reaction chamber can be equipped with multiple tiers of electrode shelves, allowing for the processing of a large number of substrates in various shapes, from small components to square substrates for FPD. Additionally, it is a plasma cleaner that can select from three processing modes (RIE mode, plasma mode, downstream mode), enabling optimal processing according to the type of substrate.

  • Other cleaning machines

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Small Plasma Cleaner (Simple Sheet-Type Plasma Cleaner)

Small Plasma Cleaner (Simple Sheet-Type Plasma Cleaner)

Small Plasma Cleaner (Simple Sheet-Type Plasma Cleaner)

This device is a simple sheet-type plasma cleaner using parallel plate high-frequency plasma. It is a compact process device measuring 600mm (W) × 600mm (D) × 750mm (H) (excluding the pump).

  • Etching Equipment
  • Ashing device

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Plasma Cleaner V1000/1000X/1000XS

Plasma Cleaner V1000/1000X/1000XS

Plasma Cleaner V1000/1000X/1000XS

Plasma cleaner with 13.56MHz high-frequency power applied 【Features】 ○ Equipped with both RIE and DP modes ○ Adopts a two-stage electrode system, improving processing efficiency (V1000X) ○ Special electrode structure can be modified to enhance plasma efficiency ○ High-precision matching unit and RF power supply with high reliability ● For other functions and details, please contact us.

  • Plasma Generator

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Small Plasma Cleaner "KNPC-1"

Small Plasma Cleaner "KNPC-1"

12-inch wafer processing with ring attachment is possible! Surface modification, removal of inorganic/organic contamination! Ideal for evaluation and research before mass production! High speed, low cost.

★ 12-inch wafer processing with ring attachment is possible! ★ Surface modification, removal of inorganic/organic contamination! ★ Ideal for evaluation and research before mass production! ★ High speed, low cost ★ Various optional features ★ Compatible with 300mm wafers and rectangular substrates [Main Performance] - Achievable pressure: 6.0 Pa or lower (when gas ballast is closed) * Uses a dry pump with a maximum exhaust speed of 500 L/min - Leak rate: 1.07 Pa/min or lower * Build-up standard value: Converted to chamber volume as 0.1 Pa·L/sec - RF power control: 13.56 MHz / 100 to 1,000 W - Process gas flow control: Within ±10% of the set value - Etching performance Inorganic etching rate: Average of 20 nm/min or more ±20% Organic etching rate: Average of 500 nm/min or more ±20% Test chips placed at 5 points on a φ300 electrode * Placed at 4 points on the φ280 circumference and 1 point in the center * When using rectangular electrodes [optional], placed at 4 points on the corners of a 300 mm square and 1 point in the center Wide-range auto-tuning

  • Company：KNE
  • Price：Other
  • Wafer
  • Other semiconductors
  • Other electronic parts

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Plasma Cleaner PC-300

Plasma Cleaner PC-300

It is a batch-type plasma cleaning device (plasma cleaner) suitable for surface modification.

This device allows you to select the processing mode from RIE mode and plasma mode, enabling optimal processing according to the type of substrate. Additionally, it is a very compact tabletop plasma cleaner designed to save space and can be used in various locations.

  • Other cleaning machines

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Reduction Plasma Cleaner "Aqua Plasma Cleaner"

Reduction Plasma Cleaner "Aqua Plasma Cleaner"

Achieving safe reduction and cleaning of metal oxide films! Plasma treatment device using water vapor.

The "Aqua Plasma Cleaner" is a plasma treatment device that primarily uses water vapor. It can safely and efficiently perform surface treatments such as the reduction of metal oxide films, cleaning of organic contaminants, photoresist ashing, and hydrophilization. It can be applied to the reduction, modification, and cleaning of silver and copper electrodes, as well as the reduction of other metal oxides, surface modification of resins, hydrophilization, and ashing. 【Features】 ■ Achieves safe reduction and cleaning of metal oxide films ■ Addition of oxygen enables faster cleaning speeds ■ Built-in automatic control system for water vapor generation and supply ■ Dedicated design reduces installation area to 60% of conventional models ■ Supports multi-stage processing (up to 3 stages) *For more details, please refer to the PDF document or feel free to contact us.

  • Other cleaning machines

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